OPTIONS LS=72;
TITLE 'EXAMPLE 23. MODEL WITH CROSSED AND NESTED EFFECTS: SCONDUCT DATA';
DATA SCONDUCT;
N=_N_;
INPUT ET WAFER POS RESIST @@;
CARDS;
1 1 1 5.22 1 1 2 5.61 1 1 3 6.11 1 1 4 6.33
1 2 1 6.13 1 2 2 6.14 1 2 3 5.60 1 2 4 5.91
1 3 1 5.49 1 3 2 4.60 1 3 3 4.95 1 3 4 5.42
2 1 1 5.78 2 1 2 6.52 2 1 3 5.90 2 1 4 5.67
2 2 1 5.77 2 2 2 6.23 2 2 3 5.57 2 2 4 5.96
2 3 1 6.43 2 3 2 5.81 2 3 3 5.83 2 3 4 6.12
3 1 1 5.66 3 1 2 6.25 3 1 3 5.46 3 1 4 5.08
3 2 1 6.53 3 2 2 6.50 3 2 3 6.23 3 2 4 6.84
3 3 1 6.22 3 3 2 6.29 3 3 3 5.63 3 3 4 6.36
4 1 1 6.75 4 1 2 6.97 4 1 3 6.02 4 1 4 6.88
4 2 1 6.22 4 2 2 6.54 4 2 3 6.12 4 2 4 6.61
4 3 1 6.05 4 3 2 6.15 4 3 3 5.55 4 3 4 6.13
;
PROC GLM;
CLASS ET WAFER POS;
MODEL RESIST=ET WAFER(ET) POS ET*POS/SS3;
RUN;
CONTRAST 'ET1 VS ET2 IN POS1' ET 1 -1 0 0 ET*POS 1 0 0 0 -1;
RUN;