In a semiconductor plant, an engineer is investigating the effect of several modes of a process condition (ET) on resistance in computer chips. 12 silicon wafers (WAFER) were drawn from a lot, and three wafers were randomly assigned to each of 4 modes of ET. Resistance (RESIST) in the chips was measured in 4 positions (POS) on each wafer, post processing. The data is shown below.
Source: Littell, R.C., Freund, R.J. and Spector, P.C. (1991). SAS System for Linear Models. SAS Institute Inc.
Table 23: Sconduct Data
OBS RESIST ET WAFER POS 1 5.22 1 1 1 2 5.61 1 1 2 3 6.11 1 1 3 4 6.33 1 1 4 5 6.13 1 2 1 6 6.14 1 2 2 7 5.60 1 2 3 8 5.91 1 2 4 9 5.49 1 3 1 10 4.60 1 3 2 11 4.95 1 3 3 12 5.42 1 3 4 13 5.78 2 1 1 14 6.52 2 1 2 15 5.90 2 1 3 16 5.67 2 1 4 17 5.77 2 2 1 18 6.23 2 2 2 19 5.57 2 2 3 20 5.96 2 2 4 21 6.43 2 3 1 22 5.81 2 3 2 23 5.83 2 3 3 24 6.12 2 3 4 25 5.66 3 1 1 26 6.25 3 1 2 27 5.46 3 1 3 28 5.08 3 1 4 29 6.53 3 2 1 30 6.50 3 2 2 31 6.23 3 2 3 32 6.84 3 2 4 33 6.22 3 3 1 34 6.29 3 3 2 35 5.63 3 3 3 36 6.36 3 3 4 37 6.75 4 1 1 38 6.97 4 1 2 39 6.02 4 1 3 40 6.88 4 1 4 41 6.22 4 2 1 42 6.54 4 2 2 43 6.12 4 2 3 44 6.61 4 2 4 45 6.05 4 3 1 46 6.15 4 3 2 47 5.55 4 3 3 48 6.13 4 3 4
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Keywords: Crossed effects, nested effects